METHOD FOR CORRECTING OPTICAL PROXIMITY EFFECT, CAPABLE OF INCREASING THE ACCURACY OF A TWO DIMENSIONAL CONTACT HOLE

摘要

PURPOSE: A method for correcting optical proximity effect is provided to reduce time required for correcting the optical proximity effect by rapidly and accurately calculating OPC biases.;CONSTITUTION: An OPC layer(110) sets offsets(E, F, G, H) with respect to a target layer(100). Based on the offsets, complete OPC biases(I, J, K, L) are set. Time which is required for setting the complete OPC biases is reduced by setting the offsets. The offsets are set before the complete OPS biases are set in order to improve the accuracy of optical proximity effect correction.;COPYRIGHT KIPO 2011