PLASMA CLEANING APPARATUS AND A CLEANING METHOD THEREOF, USING A MIXED GAS OF OXYGEN AND NITROGEN

摘要

PURPOSE: A plasma cleaning apparatus and a cleaning method thereof are provided to improve washing efficiency by heating a lower electrode in which a heating element is installed.;CONSTITUTION: In a plasma cleaning apparatus and a cleaning method thereof, a processing chamber(110) accommodate a target including a mask to be washed. A top electrode(120) and a bottom electrode are opposite to each other in the process chamber to form a discharge area. The top and bottom electrodes generate plasma discharge in the discharge area using a reaction gas as a medium to clean the target when receiving a DC pulse. A dielectric film(140) is arranged in the bottom electrode and mounts the target to prevent damage to the target.;COPYRIGHT KIPO 2011