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DEVICE AND METHOD FOR PROCESSING A SUBSTRATE CAPABLE OF TRANSFERRING A FOLLOWING SUBSTRATE BEFORE A PRECEDING SUBSTRATE IS COMPLETELY REVERSED
DEVICE AND METHOD FOR PROCESSING A SUBSTRATE CAPABLE OF TRANSFERRING A FOLLOWING SUBSTRATE BEFORE A PRECEDING SUBSTRATE IS COMPLETELY REVERSED
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机译:在先行处理基质之前完全处理能够转移后续基质的基质的设备和方法
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摘要
PURPOSE: A device and method for processing a substrate are provided to maximally reduce the waiting time of a transfer robot.;CONSTITUTION: A reverse giving and taking unit(RVPASS2) includes a third retention support unit(93) and a fourth retention support unit(94). The third retention support unit and the fourth retention support unit are vertically symmetrical by interposing a rotation center axis. A transfer robot transfers the substrate to the third retention support unit or the fourth retention support unit at a height position(H4). The substrate reversed by the reverse giving and taking unit is received at a height position(H3) by the transfer robot. The transfer robot transfers the following substrate before the preceding substrate is not completely reversed.;COPYRIGHT KIPO 2011
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