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METHOD FOR FORMING MASK PATTERN, CAPABLE OF PREVENTING CD INCREASE DUE TO INFLUENCE OF PATTERN DENSITY
METHOD FOR FORMING MASK PATTERN, CAPABLE OF PREVENTING CD INCREASE DUE TO INFLUENCE OF PATTERN DENSITY
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机译:形成掩模图案的方法,由于图案密度的影响,可以防止CD增加
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摘要
PURPOSE: A method for forming a mask pattern is provided to prevent a bridge by inserting a scattering bar reducing pattern density. ;CONSTITUTION: A pattern is designed. The pattern has first light shielding pads and second light shielding pads(422,424). The second light shielding pads are formed in a space among the first light shielding pads. At least one scattering bar(420) is inserted into the inside of the first light shielding pads. Pattern density is reduced.;COPYRIGHT KIPO 2011
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