PATTERN DESIGN METHOD FOR A DOUBLE PATTERNING CAPABLE OF MANUFACTURING A NANO SCALE DEVICE

摘要

PURPOSE: A pattern design method for a double patterning is provided to easily detect the weak point of the double patterning in a pattern design step. ;CONSTITUTION: An original pattern includes at least one or more patterns composed of repeated lines and spaces. The extended patterns are overlapped by extending the patterns comprising the original pattern. The number of the overlapped extended patterns is calculated. A region(410) with the odd extended patterns is detected.;COPYRIGHT KIPO 2011