首页> 外文期刊>Journal of Photopolymer Science and Technology >A Micro-nano Melt Transcription Molding Process to produce Thermoplastic Devices with Tens Nanometers Scale Fine Patterns
【24h】

A Micro-nano Melt Transcription Molding Process to produce Thermoplastic Devices with Tens Nanometers Scale Fine Patterns

机译:微纳米熔体转录成型工艺生产具有数十纳米级精细图案的热塑性器件

获取原文
获取原文并翻译 | 示例
           

摘要

A Micro-nano Melt Transcription Molding Process(MTM) was developed to produce highly functional thermoplastic devices with fine patterns on their surfaces. By taking advantage of fluidity, wettability and low modulus of molten thermoplastics, the patterns with the dimensions from tens nanometers to hundreds micrometers or millimeters with high aspect ratio(Asp= height/diameter or width) and sharp edge could be molded under high productivity. The nano hole arrays, which have the walls with width(W) 60nm X height(H) 270nm(Asp4.5) and W45nm X H320nm(Asp7.1) that partition the holes with diameter 250nm, could successfully be molded by using both PMMA(Polymethylmethacrylate) and PC(Polycarbonate). The well patterns for cell culture with W15μm X 120μm(Asp8) were molded uniformly over the surface area 100mm X 125mm with the cycle time in one minute and a little. As a result, it was confirmed that MTM proposed in this study could be applied effectively to the practical production of thermoplastic devices which have the surface patterns in a high grade and under high productivity.
机译:开发了一种微纳米熔体转录成型工艺(MTM),以生产具有在其表面上具有精细图案的高功能热塑性设备。通过利用熔融热塑性塑料的流动性,润湿性和低模量的优势,可以在高生产率下模制尺寸从几十纳米到数百微米或毫米,高纵横比(Asp =高度/直径或宽度)和锋利边缘的图案。纳米孔阵列的壁宽(W)为60nm X高度(H)为270nm(Asp4.5),宽为W45nm X H320nm(Asp7.1),可以将直径为250nm的孔分隔开。 PMMA(聚甲基丙烯酸甲酯)和PC(聚碳酸酯)。 W15μmX120μm(Asp8)的细胞培养孔图案在100mm X 125mm的表面积上均匀成型,循环时间在一分钟之内。结果,证实了本研究中提出的MTM可以有效地应用于具有高等级和高生产率的表面图案的热塑性器件的实际生产。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号