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Process for manufacturing a sub-nanometer-thick coating on an amorphous material, exhibiting nanometer-scale chemical patterns

机译:在非晶材料上制造亚纳米厚涂层的方法,表现出纳米级化学品

摘要

The present invention generally relates to a method for creating a chemically structured surface with structural elements as small as 1 nm, on a material that does not itself display a high degree of ordering, using thin molecular layers that minimize the material added through the coating. In particular, the present invention discloses a method for assembling a chemical pattern on a surface, comprising pattern elements with scales that can be as small as 1 nm, and then transferring that pattern to another substrate, on which the pattern would not form natively. In the described method, the patterned monolayer is comprised of polymerizable amphiphiles such as diyne phospholipids or diynoic acids, which are transferred from the ordering substrate using a transferring material such as poly(dimethylsiloxane).
机译:本发明一般涉及一种用于使用小于1nm的结构元件产生化学结构化表面的方法,其在本身不显示高度排序的材料上,使用薄的分子层最小化通过涂层添加的材料。 特别地,本发明公开了一种用于在表面上组装化学图案的方法,包括具有可以小至1nm的刻度的图案元素,然后将该图案转移到另一个衬底,在该图案上,图案不会自然地形成图案。 在所述方法中,图案化单层由可聚合两亲层组成,例如Diyne磷脂或脱酰胺酸,其使用诸如聚(二甲基硅氧烷)的转移材料从订购衬底转移。

著录项

  • 公开/公告号US11193042B2

    专利类型

  • 公开/公告日2021-12-07

    原文格式PDF

  • 申请/专利权人 PURDUE RESEARCH FOUNDATION;

    申请/专利号US202016820786

  • 发明设计人 SHELLEY A. CLARIDGE;TYSON C. DAVIS;

    申请日2020-03-17

  • 分类号C09D191;B05D1/28;

  • 国家 US

  • 入库时间 2022-08-24 22:39:01

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