METHOD FOR GENERATING THE RECIPE OF A CRITICAL DIMENSION-SCANNING ELECTRON MICROSCOPIC MACHINE CAPABLE OF AUTOMATICALLY GENERATING THE RECIPE WITHOUT THE LOAD OF A WAFER

摘要

PURPOSE: A method for generating the recipe of a critical dimension-scanning electron microscopic(CD-SEM) machine is provided to accurately implement a measuring operation with respect to a target position. ;CONSTITUTION: A computing unit receives drawing information from a drawing server including a plurality of drawing information(200). The drawing information is cad information or mask information including CD coordinate and pattern information. A CD measuring recipe is generated based on the received drawing information(202). The generated CD measuring recipe is applied to a CD-SEM machine(204). A measuring operation is implemented with respect to a loaded wafer using the recipe(206).;COPYRIGHT KIPO 2011