METHOD AND DEVICE FOR FORMING A BATCH TYPE EPITAXIAL LAYER CAPABLE OF SIMPLIFYING A CHAMBER STRUCTURE

摘要

PURPOSE: A method and device for forming a batch type epitaxial layer are provided to uniformly supply process gas to a plurality of substrates by rotating a boat in a chamber.;CONSTITUTION: A chamber(110) has a space for forming an epitaxial layer. A plurality of substrates(10) is received in a substrate support unit(131) of a boat(130). The boat is arranged in the chamber. A gas supply unit(140) passes through the center of the substrate support unit of the boat. The gas supply unit supplies process gas to the plurality of substrates.;COPYRIGHT KIPO 2012