首页>
外国专利>
EPITAXIAL GROWTH METHOD CAPABLE OF UNIFORMIZING THE LATTICE CONSTANT OF AN ENTIRE FIRST EPITAXIAL LAYER SURFACE, AND AN EPITAXIAL LAYER LAMINATED STRUCTURE THEREOF
EPITAXIAL GROWTH METHOD CAPABLE OF UNIFORMIZING THE LATTICE CONSTANT OF AN ENTIRE FIRST EPITAXIAL LAYER SURFACE, AND AN EPITAXIAL LAYER LAMINATED STRUCTURE THEREOF
展开▼
机译:能够使整个第一表皮层的晶格常数均匀化的表皮生长方法及其表皮层状结构
展开▼
页面导航
摘要
著录项
相似文献
摘要
PURPOSE: An epitaxial growth method and an epitaxial layer laminated structure thereof are provided to secure a stable optical property and an electrical property by minimizing defects which are generated in a second epitaxial layer.;CONSTITUTION: A first epitaxial layer where a deformity exists is prepared(S501). A metal quantum dot is formed on the first epitaxial layer(S502). The metal quantum dot moves the step of the first epitaxial layer with the difference of surface energy(S503). The metal quantum dot is transformed into a metal quantum dot semiconductor crystal which has a lattice constant corresponding to the lattice constant of the first epitaxial layer(S504). A second epitaxial layer is grown up on the first epitaxial layer(S505).;COPYRIGHT KIPO 2010
展开▼