首页> 外国专利> EPITAXIAL GROWTH METHOD CAPABLE OF UNIFORMIZING THE LATTICE CONSTANT OF AN ENTIRE FIRST EPITAXIAL LAYER SURFACE, AND AN EPITAXIAL LAYER LAMINATED STRUCTURE THEREOF

EPITAXIAL GROWTH METHOD CAPABLE OF UNIFORMIZING THE LATTICE CONSTANT OF AN ENTIRE FIRST EPITAXIAL LAYER SURFACE, AND AN EPITAXIAL LAYER LAMINATED STRUCTURE THEREOF

机译:能够使整个第一表皮层的晶格常数均匀化的表皮生长方法及其表皮层状结构

摘要

PURPOSE: An epitaxial growth method and an epitaxial layer laminated structure thereof are provided to secure a stable optical property and an electrical property by minimizing defects which are generated in a second epitaxial layer.;CONSTITUTION: A first epitaxial layer where a deformity exists is prepared(S501). A metal quantum dot is formed on the first epitaxial layer(S502). The metal quantum dot moves the step of the first epitaxial layer with the difference of surface energy(S503). The metal quantum dot is transformed into a metal quantum dot semiconductor crystal which has a lattice constant corresponding to the lattice constant of the first epitaxial layer(S504). A second epitaxial layer is grown up on the first epitaxial layer(S505).;COPYRIGHT KIPO 2010
机译:目的:提供一种外延生长方法及其外延层层压结构,以通过最小化第二外延层中产生的缺陷来确保稳定的光学性能和电性能。;组成:准备存在变形的第一外延层(S501)。在第一外延层上形成金属量子点(S502)。金属量子点以表面能的差移动第一外延层的台阶(S503)。将金属量子点转变成具有与第一外延层的晶格常数相对应的晶格常数的金属量子点半导体晶体(S504)。在第一外延层上长出第二外延层(S505)。; COPYRIGHT KIPO 2010

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