A method for controlling the rate of deposition and evaluation of the deposition alloy feeds in vacuum by emission spectroscopy with excitation by electron impact in VChE (high-frequency capacitor) DISCHARGE

摘要

FIELD: metallurgy.;SUBSTANCE: procedure consists in excitation of alloy atoms with electron impact in vapour phase, in resolution of obtained emission radiation in spectre, in recording spectre and in calculation of sedimentation rate. Also, excitation is performed with two plane parallel metal plates screened with dielectric covering positioned opposite to each other parallel to flow of vapours of evaporated alloy and connected to outputs of high frequency generator.;EFFECT: raised reliability of excitation system and expanded range of recorded emission spectres.;2 dwg