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Substrate atomic force microscopy

机译:底物原子力显微镜

摘要

The invention relates to devices used in the technique of atomic force microscopy, namely organic substrates for research and biological objects.; The substrate of an atomic force microscope comprises a silicon wafer coated with a film of Langmuir - Blodgett (LB) of five monomolecular layers of an organic compound with a total film thickness of 6.5 nm. The organic compound is tetratsianopropoksi-p-tert-butyl-thiacalix [4] arene (hereinafter - thiacalix [4] arene) of formula:; The inventive substrate atomic force microscope for applying the test samples of nanoscale has an atomically smooth surface with a size of the irregularities is not greater than 1 nm, high hydrophobicity, resistance to organic solvents and ease of manufacture. 1 Head. n. vor ly. 3 FIG.
机译:本发明涉及在原子力显微镜技术中使用的装置,即用于研究和生物目的的有机基质。原子力显微镜的基底包括硅晶片,该硅晶片上涂覆有Langmuir-Blodgett(LB)膜,该膜由有机化合物的五个单分子层组成,总膜厚为6.5 nm。所述有机化合物为四噻吩并丙酮-对-叔丁基-硫杂杯[4]芳烃(以下称为硫杂杯[4]芳烃):用于施加纳米级测试样品的本发明基底原子力显微镜具有原子光滑表面,其不规则尺寸不大于1nm,疏水性高,对有机溶剂具有抵抗力并且易于制造。 1头。好吧图3。

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