首页> 外国专利> A method for light-induced galvanic pulse deposition for the formation of a seed layer for a metal contact of a solar cell and, for the subsequent amplification of said seed layer or this metal contact, as well as an arrangement for carrying out the process

A method for light-induced galvanic pulse deposition for the formation of a seed layer for a metal contact of a solar cell and, for the subsequent amplification of said seed layer or this metal contact, as well as an arrangement for carrying out the process

机译:一种用于光诱导的电脉冲沉积的方法,用于形成用于太阳能电池的金属接触的种子层,并随后放大所述种子层或该金属接触,以及进行该工艺的装置

摘要

The present invention describes a light induced galvanic deposition method, wherein both the potential difference between a first metal contact and an auxiliary electrode in accordance with a predefined voltage - time - characteristic is varied in dependence on time, as well as a light radiation onto a solar cell according to a light irradiation - time - characteristic.
机译:本发明描述了一种光诱导的电沉积方法,其中,根据预定的电压-时间-特性,第一金属触点和辅助电极之间的电势差都随时间以及向管上的光辐射而变化。太阳能电池根据光照射-时间-特性。

著录项

  • 公开/公告号DE102009051688A1

    专利类型

  • 公开/公告日2011-04-28

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20091051688

  • 发明设计人

    申请日2009-10-23

  • 分类号H01L31/18;H01L21/283;C25D5/18;C25D7/00;

  • 国家 DE

  • 入库时间 2022-08-21 17:47:38

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