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volatile metal organic complex with a low reactivity to the verwndung in cvd deposition of metalloxidfilmen suitable
volatile metal organic complex with a low reactivity to the verwndung in cvd deposition of metalloxidfilmen suitable
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机译:在金属氧化物薄膜的cvd沉积中对硅藻土反应性低的挥发性金属有机配合物
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摘要
Novel ligated compounds of tin, titanium, and zinc are useful as metal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.
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