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Surface morphological properties of Cd_xZn_((1-x))S thin films deposited by low-cost atmospheric pressure metal organic chemical vapour deposition technique (AP-MOCVD)

机译:低成本大气压金属有机化学气相沉积技术沉积CD_XZN _((1-X))S薄膜的表面形态学性能(AP-MOCVD)

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The Cd_xZn_((1-x))S films have been deposited by low cost atmospheric pressure metal organic chemical vapour deposition (AP-MOCVD) technique and the resulting morphological properties were successfully evaluated for solar cell applications. All morphological properties presented here were investigated by Field-Emission Scanning Microscopy (FESEM) and Energy Dispersive X-Ray (EDX) spectroscopy. It has been observed that the film thickness and grain size have been greatly influenced by the molar ratio of cadmium and zinc, deposition temperature and time. The average grain size of Cd_(0.5)Zn_(0.5)S films (98.16 nm thick) was obtained with deposition temperature and time of 440°C and 2.5 minutes, respectively.
机译:通过低成本大气压金属有机化学气相沉积(AP-MOCVD)技术沉积了CD_XZN _((1-X))的薄膜,并成功地评估了所得的形态学性能的太阳能电池应用。通过现场排放扫描显微镜(FeSEM)和能量分散X射线(EDX)光谱研究了这里的所有形态学性质。已经观察到,薄膜厚度和晶粒尺寸受到镉和锌的摩尔比的大大影响,沉积温度和时间。通过沉积温度和440℃和2.5分钟的沉积温度和时间得到CD_(0.5)Zn_(0.5)Zn_(0.5)膜(98.16nm厚)的平均晶粒尺寸。

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