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DEFLECTOR ARRAY, MANUFACTURING METHOD OF DEFLECTOR ARRAY, LITHOGRAPHY APPARATUS, AND MANUFACTURING METHOD OF ARTICLE

机译:导流器阵列,导流器阵列的制造方法,光刻设备以及物品的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a deflector array in which temperature rise of the electrode pair of a deflector is minimized, and which is advantageous to improve the throughput.;SOLUTION: The deflector array 13 comprises a plurality of deflectors 31 for deflecting a charged particle beam 30. An electrode pair 33 installed for an aperture 32 through which the charged particle beam 30 passes and configuring the deflector 31, and a control circuit 34 applying a voltage to the electrode pair 33 are formed into a laminate structure consisting of at least two layers of a first layer 40 and a second layer 41. At least one layer (the first layer 40) has a heat insulation part 42 between the electrode pair 33 and the control circuit 34.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种偏转器阵列,其中偏转器的电极对的温度升高被最小化,并且有利于提高生产量。解决方案:偏转器阵列13包括用于偏转带电的多个偏转器31。电极对33被安装在至少由以下构成的层叠结构中:电极对33安装在带电粒子束30穿过的孔32中并构成偏转器31,控制电路34向电极对33施加电压。两层分别是第一层40和第二层41。至少一层(第一层40)在电极对33和控制电路34之间具有绝热部分42。版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2012182294A

    专利类型

  • 公开/公告日2012-09-20

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP20110043979

  • 发明设计人 TAKAHASHI TAKESHI;YAMAZAKI TORU;

    申请日2011-03-01

  • 分类号H01L21/027;H01J37/147;H01J37/305;

  • 国家 JP

  • 入库时间 2022-08-21 17:44:11

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