MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM WITH ACCESSIBLE DIAPHRAGM OR APERTURE STOP

摘要

PROBLEM TO BE SOLVED: To provide a compact microlithography projection optical system.;SOLUTION: The invention relates to a microlithography projection optical system for wavelengths of 248 nm or less, preferably 193 nm or less, in particular for EUV lithography for wavelengths ranging between 1-30 nm for imaging an object field in an object plane 100 onto an image field in an image plane 102. The microlithography projection optical system is provided with an accessible diaphragm plane 2000 with sufficient space, into which for instance an iris diaphragm can be introduced.;COPYRIGHT: (C)2013,JPO&INPIT