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MAGNETRON DEVICE, AND PULSE OPERATION METHOD OF MAGNETRON DEVICE

机译:磁控器件及磁控器件的脉冲操作方法

摘要

PROBLEM TO BE SOLVED: To change a flow density of particles colliding with a substrate regardless of a kind of a substrate by realizing means for adjusting a strength of an impact when high energy particles collide with a growth layer at technically low costs in a substrate coat using a magnetron device operating at pulse energy.SOLUTION: A magnetron device has a switch 16 for repeatedly switching an additional electrode 15 so that at least one additional electrode 15 temporarily becomes an anode. When the additional electrode 15 is switched to the anode by the switch 16, magnetron discharging occurs between a target 13 switched to function as a cathode among a target 12 and the target 13, and the additional electrode 15.
机译:解决的问题:通过实现当高能粒子以技术上较低的成本在底涂层中实现当高能粒子与生长层碰撞时调节冲击强度的装置,以改变与底物碰撞的颗粒的流动密度,而与底物的类型无关。解决方案:磁控管设备具有一个开关16,用于重复切换一个附加电极15,以便至少一个附加电极15暂时成为阳极。当通过开关16将附加电极15切换为阳极时,在被转换为靶12和靶13中的阴极的靶13与附加电极15之间发生磁控管放电。

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