Photosensitive resin composition and a new acid group-containing vinyl ester resin

摘要

PROBLEM TO BE SOLVED: To provide a composition for alkali development type resist ink which can respond to direct exposure technique by laser and which has super-high sensitivity exhibiting excellent curing properties even with low exposure energy, coating hardness and a wide heat management width, and to provide a vinyl ester resin which can give such properties to the composition for alkali development type resist ink.;SOLUTION: This resin composition contains as essential ingredients a vinyl ester resin obtained by reacting acrylic acid with a resorcin-orthocresol novolac type epoxy resin and then reacting tetrahydrophthalic anhydride, a photo polymerization initiator and an epoxy resin.;COPYRIGHT: (C)2009,JPO&INPIT