首页> 外国专利> Being the manner which produces the mannered, and mannered produce III group nitride semiconductor optical component null III

Being the manner which produces the mannered, and mannered produce III group nitride semiconductor optical component null III

机译:作为产生顺畅的方式,并且顺畅地产生III族氮化物半导体光学成分无效III

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a group III nitride semiconductor optical element having an excellent element characteristics by accurately measuring the intensity of a photoluminescence spectrum.;SOLUTION: A PL spectrum is measured by irradiating a substrate prodcuct E1 with excitation light LEX. The PL spectrum comprises a constituent LOUT2 from a GaN semiconductor region 19 and a constituent LOUT1 from a GaN semiconductor region 17. The constituent LOUT2 comprises a direct constituent L(D)OUT2 and a reflection constituent L(R)OUT2 which is reflected on the rear face 11b of the non-mirror surface of a substrate 11, and thereby generated. The constituent LOUT1 also comprises a direct constituent L(D)OUT1 and a reflection constituent L(R)OUT1 which is reflected on the rear face of the non-mirror surface of the substrate 11, and thereby generated. A ratio (LOUT2/LOUT1) of a second constitutent LOUT2 to a first constitutent LOUT1 ratio is created after the measurement of the PL spectrum. The ratio is compared with a predetermined value representing the quality of the second GaN semiconductor region 19. The substrate product E1 is selected based on the comparison result.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种通过精确地测量光致发光光谱的强度来制造具有优异的元件特性的III族氮化物半导体光学元件的方法。解决方案:通过用激发光照射基板产品E1来测量PL光谱。 L EX 。 PL光谱包括来自GaN半导体区域19的成分L OUT2 和来自GaN半导体区域17的成分L OUT1 。该成分L OUT2 包括直接成分L(D) OUT2 和反射成分L(R) OUT2 ,其在基板的非镜面的背面11b上反射。 11,从而生成。成分L OUT1 还包括直接成分L(D) OUT1 和反射成分L(R) OUT1 基板11的非镜面的表面形成并由此产生。第二成分L OUT2 与第一成分L OUT1 的比率(L OUT2 / L OUT1 )是在测量PL光谱后创建的。将该比率与代表第二GaN半导体区域19的质量的预定值进行比较。基于比较结果选择衬底产品E1。COPYRIGHT:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP4935591B2

    专利类型

  • 公开/公告日2012-05-23

    原文格式PDF

  • 申请/专利权人 住友電気工業株式会社;

    申请/专利号JP20070235846

  • 发明设计人 京野 孝史;善積 祐介;

    申请日2007-09-11

  • 分类号H01L33/32;

  • 国家 JP

  • 入库时间 2022-08-21 17:39:08

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号