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The new silicon precusor in order to produce the ultralow K membrane which possesses high mechanical qualities with the plasma promotion chemical evaporation

机译:新的硅预激器是为了生产具有超高K机械性能的超低K膜,并具有促进等离子体的化学蒸发作用

摘要

Low the method of making the permittivity membrane accumulate on the baseplate is offered. The permittivity membrane is made to accumulate low with the process which includes the fact that the pore is formed in the membrane with 1 kinds or the plural organosilicic compounds and reacting the polo gene and after processing the membrane next. As 1 kinds or plural organosilicic compounds, general structure Si C x Si or Si O (CH2) you can list the chemical compound which possesses n O Si . You can list the membrane which includes Si C x Si connection in both before and after the after-treatment of the membrane as it is stated in this bill a permittivity membrane low. Low the permittivity membrane, has satisfactory mechanical quality and adhesiveness, and desirable permittivity.
机译:提供了低介电常数膜积聚在底板上的方法。通过以下步骤使介电常数降低至低,该步骤包括以下事实:在膜中用一种或多种有机硅化合物形成孔并与polo基因反应,然后处理膜。作为一种或多种有机硅化合物,一般结构为Si C x Si 或Si O(CH 2 ),您可以列出具有 n O Si < / Sub>。您可以列出在膜的后处理之前和之后均包含Si C x Si 连接的膜,如该法案所述,介电常数低。介电常数低的膜,具有令人满意的机械质量和粘合性,以及理想的介电常数。

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