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Optical Properties of Oxidized Plasma-Polymerized Organosilicones and Their Correlation with Mechanical and Chemical Parameters

机译:氧化等离子体聚合有机硅的光学性质及其与机械和化学参数的关系

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摘要

Pure tetravinylsilane and its oxygen mixture were used to deposit oxidized plasma polymer films at various effective power (0.1–10 W) and various oxygen fractions (0–0.71) using RF pulsed plasma. The optical properties (refractive index, extinction coefficient, band gap) of the deposited films were investigated by spectroscopic ellipsometry (230–830 nm) using an optical model and Tauc‒Lorentz parametrization. Analyses of chemical and mechanical properties of films allowed for the interpretation of changes in optical properties with deposition conditions. The refractive index was revealed to increase with enhanced effective power due to the increased crosslinking of the plasma polymer network but decreased when increasing the oxygen fraction due to the decrease of polymer crosslinking as the number of carbon bonds in the plasma polymer network was eliminated. A very strong positive correlation was found between the Young’s modulus and the refractive index for oxidized plasma polymer films. The optical properties of films correlated with their chemical properties for the specific deposition conditions used in this study. The band gap (1.9–2.9 eV) was assumed to be widened due to the increased concentration of vinyl groups in oxidized plasma polymer films.
机译:纯四乙烯基硅烷及其氧气混合物用于使用RF脉冲等离子体以各种有效功率(0.1–10 W)和各种氧气含量(0–0.71)沉积氧化的等离子体聚合物薄膜。使用光学模型和Tauc‒Lorentz参数化,通过椭圆偏振光谱法(230–830 nm)研究了沉积膜的光学性质(折射率,消光系数,带隙)。薄膜的化学和机械性能分析可以解释沉积条件下光学性能的变化。揭示出由于等离子体聚合物网络中交联的增加,折射率随着有效功率的增加而增加,但是当氧分数增加时,由于消除了等离子体聚合物网络中的碳键数,由于聚合物交联的减少,折射率降低了。发现氧化等离子体聚合物薄膜的杨氏模量与折射率之间存在非常强的正相关性。对于本研究中使用的特定沉积条件,薄膜的光学性能与其化学性能相关。假定带隙(1.9–2.9 eV)由于氧化等离子体聚合物薄膜中乙烯基浓度的增加而变宽。

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