The split ring magnet in the magnetron sputtering chamber

摘要

Split magnet ring (70), tantalum, also sputter deposited to a via barrier or other metal tungsten, magnetron plasma reactor for re-sputter etched into the via side wall on the deposited material from the bottom of the via (10) It is particularly useful in. Wherein the annular magnet rings of two of the same axial polarity (72, 74), the annular magnet rings of the two, the magnet ring is non-magnetic vinegar having an axial length of the associated pole faces and at least one magnet and are separated by (76) pacing. (36) is rotated around the target (16) non-equilibrium magnetron small, has the outside pole of the same polarity as that of the (72, 74) ring magnet (42), non-equilibrium magnetron of this small, the outer pole surrounds (40) weaker inner pole of opposite polarity. [Selection Figure Figure 4