The silver and/or the photoresist burble liquid constituent of the substrate which includes the silver alloy, production manner of the pattern which uses that and the display null silver which includes

摘要

PROBLEM TO BE SOLVED: To provide a photoresist stripper composition applicable to a substrate containing silver and/or silver alloy.;SOLUTION: The photoresist stripper composition for the substrate containing silver and/or silver alloy contains one or more selected from a group consisting of compounds expressed by formula (I): NH₂-A-Y-B-Z, formula (II): NH₂-A-N(-B-OH)₂, morpholine, N-substituted morpholine, pyrocatechol, hydroquinone, pyrogallol, gallic acid, and gallic acid esters, and one or more polar organic solvents. In the formula (I), A and B independently represents a straight-chain or branched-chain 1 to 5C alkylene group; Y represents NH or O; Z represents NH₂, OH, or NH-D-NH₂, wherein D represents a straight-chain or branched-chain 1-5C alkylene group. In the formula (II), A and B are the same as in the formula (I).;COPYRIGHT: (C)2009,JPO&INPIT