Method of manufacturing the electrostatic chucking electrode, the substrate processing apparatus and an electrostatic chucking electrode

摘要

PROBLEM TO BE SOLVED: To provide an electrostatic attraction electrode that suppresses the formation of a crack on an insulating layer, to provide a substrate processor thereof, and to provide a manufacturing method for the electrostatic attraction electrode.;SOLUTION: An electrostatic chuck 40b includes a base material 41, a second insulating layer 44b that is an alumina-sprayed film, and a first insulating layer 42b interposed between the base material 41 and the second insulating layer 44b. The first insulating layer 42b is made of a ceramic-sprayed film having a linear expansion coefficient that is different from a linear expansion coefficient of the base material 41 by an absolute value of 14×10^-6[/°C] or less. The first insulating layer 42b functions as a buffering layer, which improves the heat resistance of the electrostatic chuck 40b to suppress crack formation.;COPYRIGHT: (C)2008,JPO&INPIT