首页> 外国专利> Semiconductor Device and Method of Forming an Interconnect Structure with Conductive Material Recessed Within Conductive Ring Over Surface of Conductive Pillar

Semiconductor Device and Method of Forming an Interconnect Structure with Conductive Material Recessed Within Conductive Ring Over Surface of Conductive Pillar

机译:半导体器件和形成互连结构的方法,该互连结构具有凹入在导电柱表面上的导电环内的导电材料

摘要

A semiconductor device has a semiconductor die with a first conductive layer formed over an active surface of the semiconductor die. An insulation layer is formed over the active surface of the semiconductor die. A second conductive layer is conformally applied over the insulating layer and first conductive layer. Conductive pillars are formed over the first conductive layer. Conductive rings are formed around a perimeter of the conductive pillars. A conductive material is deposited over the surface of the conductive pillars within the conductive rings. A substrate has a third conductive layer formed over a surface of the substrate. The semiconductor die is mounted to a substrate with the third conductive layer electrically connected to the conductive material within the conductive rings. The conductive rings inhibit outward flow of the conductive material from under the conductive pillars to prevent electrical bridging between adjacent conductive pillars.
机译:半导体器件具有半导体管芯,该半导体管芯具有形成在半导体管芯的有源表面上方的第一导电层。在半导体管芯的有源表面上方形成绝缘层。在绝缘层和第一导电层上方共形地施加第二导电层。导电柱形成在第一导电层上方。围绕导电柱的周边形成导电环。导电材料沉积在导电环内的导电柱的表面上。基板具有形成在基板表面上方的第三导电层。半导体管芯安装到衬底,其中第三导电层电连接到导电环内的导电材料。导电环阻止导电材料从导电柱下方向外流动,以防止相邻导电柱之间的电桥接。

著录项

  • 公开/公告号US2012273938A1

    专利类型

  • 公开/公告日2012-11-01

    原文格式PDF

  • 申请/专利权人 SANG MI PARK;DAESIK CHOI;

    申请/专利号US201113098448

  • 发明设计人 SANG MI PARK;DAESIK CHOI;

    申请日2011-04-30

  • 分类号H01L23/498;H01L21/60;

  • 国家 US

  • 入库时间 2022-08-21 17:33:58

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