MICRO/NANO IMPRINT MOLD OF THE FABRICATING PROCESS AND THE METHOD OF FABRICATING HIGH ASPECT RATIO ANTI-ETCH STRUCTURE BY UTILIZING THEREOF

摘要

The invention discloses a mold performing in the micro/nano imprint fabricating process, wherein the mold is utilized to imprint a pattern on a substrate via a material layer. The mold comprises an upper surface, a lower surface, a pre-determined structure and an overflow controlling device. The upper surface and the lower surface are corresponded to each other. The pre-determined structure is disposed on the lower surface of the mold. The overflow controlling device is utilized to maintain the pressure among the material layer and the substrate.