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Semiconductor heterostructures to reduce short channel effects

机译:半导体异质结构以减少短沟道效应

摘要

Semiconductor heterostructures to reduce short channel effects are generally described. In one example, an apparatus includes a semiconductor substrate, one or more buffer layers coupled to the semiconductor substrate, a first barrier layer coupled to the one or more buffer layers, a back gate layer coupled to the first barrier layer wherein the back gate layer includes a group III-V semiconductor material, a group II-VI semiconductor material, or combinations thereof, the back gate layer having a first bandgap, a second barrier layer coupled to the back gate layer wherein the second barrier layer includes a group III-V semiconductor material, a group II-VI semiconductor material, or combinations thereof, the second barrier layer having a second bandgap that is relatively larger than the first bandgap, and a quantum well channel coupled to the second barrier layer, the quantum well channel having a third bandgap that is relatively smaller than the second bandgap.
机译:总体上描述了减少短沟道效应的半导体异质结构。在一个示例中,一种装置包括:半导体衬底,耦合至半导体衬底的一个或多个缓冲层,耦合至一个或多个缓冲层的第一势垒层,耦合至第一势垒层的背栅层,其中背栅层包括III-V族半导体材料,II-VI族半导体材料或其组合,背栅层具有第一带隙,耦合至背栅层的第二势垒层,其中第二势垒层包括III-族族V半导体材料,II-VI族半导体材料或其组合,第二势垒层具有相对大于第一带隙的第二带隙,以及耦合至第二势垒层的量子阱沟道,该量子阱沟道具有第三带隙相对小于第二带隙。

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