首页> 外国专利> Method for designing wiring topology for electromigration avoidance and fabrication method of integrate circuits including said method

Method for designing wiring topology for electromigration avoidance and fabrication method of integrate circuits including said method

机译:设计用于避免电迁移的布线拓扑的方法以及包括该方法的集成电路的制造方法

摘要

A method for designing wiring topology for electromigration avoidance, which is composed of multiple sources, multiple sinks and multiple wires, is disclosed. The steps of said method to get an optimal topology includes: 1. calculating the length of all the wires to choose one of the wires with the shortest length as a feasible wire, 2. deciding a capacity of the feasible wire, 3. deciding the capacities of the other wire according to the capacity of the feasible wire, a flow of the source of the feasible wire and a flow of the sink of the feasible wire, 4. comparing the length of the other wires to select another feasible wire, 5. repeating said steps until finding all feasible wires for constructing a feasible topology, 6. creating a flow network according to the feasible topology, 7. iteratively checking if a negative cycle exists in the flow network and removing it until no more negative cycles.
机译:公开了一种用于设计用于避免电迁移的布线拓扑的方法,该方法由多个源,多个汇和多个导线组成。所述获得最佳拓扑的方法的步骤包括:1.计算所有导线的长度以选择具有最短长度的一根导线作为可行导线,2.确定可行导线的容量,3.确定导线的容量。根据可行线的容量,可行线的源流和可行线的汇流,选择另一条线的容量。4.比较其他线的长度以选择另一条可行线,5重复上述步骤,直到找到用于构建可行拓扑的所有可行导线为止; 6.根据可行拓扑创建流网络; 7.反复检查流网络中是否存在负循环,并将其删除,直到没有更多负循环为止。

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