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System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules
System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules
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机译:用于使用分子的强制组装在图案化介质的制造过程中进行图案清洁的系统,方法和设备
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摘要
A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.
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