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Integrated circuit including different types of gate stacks, corresponding intermediate integrated circuit structure and corresponding integrated circuit

机译:包括不同类型的栅极堆叠的集成电路,相应的中间集成电路结构和相应的集成电路

摘要

The present invention provides a manufacturing method for an integrated circuit and a corresponding integrated circuit. The integrated circuit comprises a plurality of first devices, each first device including a charge storage layer and a control electrode comprising a plurality of layers; and a plurality of second devices coupled to at least one of the plurality of first devices, each second device including a control electrode comprising at least one layer different from said plurality of layers.
机译:本发明提供了一种集成电路的制造方法以及相应的集成电路。该集成电路包括多个第一器件,每个第一器件包括电荷存储层和包括多个层的控制电极。多个第二装置耦接至多个第一装置中的至少一个,每个第二装置包括控制电极,该控制电极包括与所述多个层不同的至少一层。

著录项

  • 公开/公告号US8072072B2

    专利类型

  • 公开/公告日2011-12-06

    原文格式PDF

  • 申请/专利权人 LARS BACH;

    申请/专利号US20070903017

  • 发明设计人 LARS BACH;

    申请日2007-09-20

  • 分类号H01L23/52;H05K7/00;

  • 国家 US

  • 入库时间 2022-08-21 17:25:45

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