PROCESS FOR FORMATION OF NANOCRYSTALLINE YTTRIA-STABILISED ZIRCONIA THIN FILMS AND APPARATUS THEREOF

摘要

The present subject matter relates to a process and apparatus of plasma-assisted liquid injection chemical vapour deposition for the formation of nanocrystalline yttria-stabilised zirconia thin films. The process for depositing a thin film on a substrate includes dissolving metallorganic complexes of yttrium and zirconium in a solvent to obtain a solution, placing the substrate in a deposition chamber, treating the substrate with oxygen and nitrogen gas, generating a nitrogen/oxygen plasma in the deposition, heating the substrate, vapourizing the solution in a vapourizing unit to produce vapours, transporting the vapours to the deposition chamber, and cracking the vapours in the nitrogen/oxygen plasma in the deposition chamber for depositing a thin film onto the substrate. FIG.1