首页> 外国专利> METHOD OF MATERIAL ANALYSIS BY MEANS OF A FOCUSED ELECTRON BEAM USING CHARACTERISTIC X-RAYS AND BACK-SCATTERED ELECTRONS AND THE EQUIPMENT TO PERFORM IT

METHOD OF MATERIAL ANALYSIS BY MEANS OF A FOCUSED ELECTRON BEAM USING CHARACTERISTIC X-RAYS AND BACK-SCATTERED ELECTRONS AND THE EQUIPMENT TO PERFORM IT

机译:利用特征X射线和反散射电子通过聚焦电子束进行材料分析的方法及其所用的设备

摘要

A material analysis method by a focused electron beam and an equipment for performing such an analysis where an electron map B is created describing the intensity of emitted back-scattered electrons at various points on a sample, and a spectral map S is created describing the intensity of emitted X-rays at points on the sample depending on the radiation energy. For selected chemical elements, X-ray maps Mi are created representing the intensity of X-rays characteristic for such elements. The X-ray maps Mi and the electron map B are converted into differential X-ray maps Di, which are subsequently merged into a final differential X-ray map D. The final differential X-ray map D is then used to search particles. Subsequently, a cumulative X-ray spectrum Xj is calculated for each particle and subsequently the classification of particles based on the peak intensities and the intensity of back-scattered electron is performed.
机译:通过聚焦电子束的材料分析方法和用于执行这种分析的设备,其中创建电子图B来描述样品上各个点上发射的反向散射电子的强度,并创建光谱图S来描述强度样品上各点的X射线发射量取决于辐射能。对于选定的化学元素,创建了X射线图Mi,表示这些元素的X射线特征强度。 X射线图Mi和电子图B被转换为差分X射线图Di,随后将其合并为最终差分X射线图D。然后,最终差分X射线图D用于搜索粒子。随后,为每个粒子计算累积的X射线光谱Xj,随后基于峰值强度和反向散射电子的强度对粒子进行分类。

著录项

  • 公开/公告号ZA201201095B

    专利类型

  • 公开/公告日2012-10-31

    原文格式PDF

  • 申请/专利权人 TESCAN ORSAY HOLDING A.S.;

    申请/专利号ZA20120001095

  • 发明设计人 DAVID MOTL;VOJTECH FILIP;

    申请日2012-02-15

  • 分类号G01N23/2252;H01J;G01N23/2251;

  • 国家 ZA

  • 入库时间 2022-08-21 17:22:32

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