首页> 外国专利> Method of material analysis by means of a focused electron beam using characteristic X-rays and back-scattered electrons and the equipment to perform it

Method of material analysis by means of a focused electron beam using characteristic X-rays and back-scattered electrons and the equipment to perform it

机译:通过使用特征X射线和反向散射电子的聚焦电子束进行材料分析的方法及其执行设备

摘要

#$%^&*AU2012201146A120121011.pdf#####Abstract Method of material analysis by means of focused electron beam using characteristic X-rays and back-scattered electrons and equipment to perform it A material analysis method by a focused electron beam and an equipment for performing such an analysis where an electron map B is created describing the intensity of emitted back-scattered electrons at various points on a sample, and a spectral map S is created describing the intensity of emitted X-rays at points on the sample depending on the radiation energy. For selected chemical elements, X-ray maps Mi are created representing the intensity of X-rays characteristic for such elements. The X-ray maps Mi and the electron map B are converted into differential X-ray maps Di, which are subsequently merged into a final differential X-ray map D. The final differential X-ray map D is then used to search particles. Subsequently, a cumulative X-ray spectrum Xj is calculated for each particle, whereas points on the sample located on the edge of the particle have lower weight than points inside the particle. The cumulative X-ray spectrum Xj is then processed to get peak intensities of chemical elements and subsequently the classification of particles based on the peak intensities and the intensity of back-scattered electron is performed.1/8 --------------------------------------------------------------------------------101 131 X X IX X I 8 10 *I 3 13 Fig.I
机译:#$%^&* AU2012201146A120121011.pdf #####抽象利用特性的聚焦电子束进行材料分析的方法X射线和背向散射电子及执行此操作的设备聚焦电子束的材料分析方法及设备执行这样的分析,其中创建电子图B来描述样品上各个点发射的反向散射电子的强度,以及创建光谱图S来描述在X点上的点处发出的X射线的强度样品取决于辐射能。对于选定的化学元素,X射线创建映射Mi来表示此类特征的X射线强度元素。 X射线图Mi和电子图B转换为微分X射线图Di,随后将其合并为最终的差分X射线图D.然后使用最终的X射线微分图D搜索粒子。随后,计算每个粒子的累积X射线光谱Xj,而位于粒子边缘的样本的权重比内部粒子的权重低粒子。然后对累积的X射线光谱Xj进行处理以获得峰值强度化学元素和随后基于颗粒的颗粒分类进行峰强度和反向散射电子的强度。1/8-------------------------------------------------- ------------------------------101131X X九十我810 *我3 13图一

著录项

  • 公开/公告号AU2012201146A1

    专利类型

  • 公开/公告日2012-10-11

    原文格式PDF

  • 申请/专利权人 TESCAN A.S.;

    申请/专利号AU2012201146A1

  • 发明设计人 MOTL DAVID;FILIP VOJTECH;

    申请日2012-02-27

  • 分类号G01N23/225;G01N23/203;

  • 国家 AU

  • 入库时间 2022-08-21 17:19:00

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