A METHOD OF ANALYSIS OF MATERIALS BY MEANS OF A FOCUSED ELECTRON BEAM USING CHARACTERISTIC X-RAYS AND BACK-SCATTERED ELECTRONS

摘要

The invention relates to a method of analysis of materials by means of a focused electron beam and a device thereof, where the electron beam is gradually deflected into a number of points on a sample arranged in a regular grid, creating an electron map. A set of temporary particles and a set of new measuring points are determined by means of the electron map, wherein the set of new measuring points comprises less elements than the set of the initial measuring points, and the set of new measuring points comprises at least one measuring point for each particle from the set of temporary particles. The electron beam is deflected along the set of new measuring points, the emitted X-rays are measured and an X-ray spectrum is created, a set of particles is determined, and accumulated spectrums of X-ray radiation for a particle based on the spectrums measured in the points, which are not part of the particle, are created.