Method of manufacturing light-receiving/emitting diode array chip

摘要

A method is for manufacturing a light-emitting or a light-receiving diode array chip. A first interlayer dielectric (213, 113, 13) is formed in each of a plurality of chip areas (K) on a substrate (11) of a first conductivity type. Impurity diffusion regions of a second conductivity type are formed in the substrate (11) using the first interlayer dielectric (213, 113, 13) as a diffusion mask. An electrode (21) is formed in contact with each of the impurity diffusion regions. The substrate (11) is separated so that the plurality of chip areas are separated into individual chips. A second interlayer dielectric (31) may be formed on the first interlayer dielectric (13) after forming the impurity diffusion regions. The second interlayer dielectric (31) is formed such that the second interlayer dielectric is absent from a second area (L1, L2) along which the substrate (11) is separated into the individual chips, at least in the vicinity of the last one (14a) of a plurality of windows (14). Island-shaped patterns (33) may be formed on the interlayer dielectric so as to hold the interlayer dielectric onto the substrate. The first interlayer dielectric (213, 13) may be removed such that the first interlayer dielectric (213, 13) is absent from the second area (L1, L2), at least in the vicinity of the last one (14a) of the plurality of windows (14). IMAGE