首页>
外国专利>
DEPOSITION OF PEROVSKITE AND OTHER COMPOUND CERAMIC FILMS FOR DIELECTRIC APPLICATIONS
DEPOSITION OF PEROVSKITE AND OTHER COMPOUND CERAMIC FILMS FOR DIELECTRIC APPLICATIONS
展开▼
机译:用于电介质的钙钛矿和其他复合陶瓷膜的沉积
展开▼
页面导航
摘要
著录项
相似文献
摘要
In accordance with the present invention, deposition of perovskite material, for example barium strontium titanite (BST) film, by a pulsed-dc physical vapor deposition process or by an RF sputtering process is presented. Such a deposition can provide a high deposition rate deposition of a layer of perovskite. Some embodiments of the deposition address the need for high rate deposition of perovskite films, which can be utilized as a dielectric layer in capacitors, other energy storing devices and micro-electronic applications. Embodiments of the process according to the present invention can eliminate the high temperature (700° C.) anneal step that is conventionally needed to crystallize the BST layer.
展开▼