Selectively deposited thin film devices and methods for forming selectively deposited thin films

摘要

A method for selectively depositing a thin film structure (515) on a substrate. The method includes providing a process gas (709) to a surface (705) of the substrate and directing concentrated electromagnetic energy (703) from a source of energy (701) to at least a portion of the surface (705). The process gas (709) is decomposed onto the substrate to form a selectively deposited thin film structure (515). A thin film device and apparatus for forming a selectively deposited thin film structure (515) are also disclosed.