首页> 外国专利> METHOD FOR MANUFACTURING A VERTICAL STRUCTURE TYPE LIGHT EMITTING DIODE CAPABLE OF SIMULTANEOUSLY OBTAINING OHMIC FEATURES AND LIGHT REFLECTION FEATURES

METHOD FOR MANUFACTURING A VERTICAL STRUCTURE TYPE LIGHT EMITTING DIODE CAPABLE OF SIMULTANEOUSLY OBTAINING OHMIC FEATURES AND LIGHT REFLECTION FEATURES

机译:可同时获得欧姆特性和光反射特性的垂直结构型发光二极管的制造方法

摘要

PURPOSE: A method for manufacturing a vertical structure type light emitting diode is provided to prevent stress applied to a semiconductor layer by a nitrogen gas and a gallium seed, thereby increasing a yield and enhancing device features.;CONSTITUTION: A semiconductor layer(120) is formed on a substrate(110). A p-type electrode(130) is formed on the semiconductor layer. A pattern connected from the p-type electrode to the substrate has a fixed depth. A support layer(140) is formed on the p-type electrode. The pattern is exposed by grinding the lower surface of the substrate. The substrate is separated from the semiconductor layer.;COPYRIGHT KIPO 2012
机译:目的:提供一种垂直结构型发光二极管的制造方法,以防止氮气和镓种子施加到半导体层上的应力,从而提高良率并增强器件特性。;构成:半导体层(120)在衬底(110)上形成衬底。在半导体层上形成有p型电极(130)。从p型电极连接到基板的图案具有固定的深度。在p型电极上形成支撑层(140)。通过研磨基板的下表面来暴露图案。衬底与半导体层分离。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20110138566A

    专利类型

  • 公开/公告日2011-12-28

    原文格式PDF

  • 申请/专利权人 HEESUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20100058514

  • 发明设计人 KIM JONG HWAN;

    申请日2010-06-21

  • 分类号H01L33/02;

  • 国家 KR

  • 入库时间 2022-08-21 17:11:14

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