MOLECULAR FLUORINE ETCHING OF SILICON THIN FILMS FOR PHOTOVOLTAIC AND OTHER LOWER-TEMPERATURE CHEMICAL VAPOR DEPOSITION PROCESSES

摘要

Improved techniques for the cleaning of amorphous and microcrystalline silicon thin films used in photovoltaic applications. In greater detail, methods for the use of molecular fluorine for cleaning of thin films used in photovoltaic applications and devices formed thereby are described.