VAPORIZING APPARATUS FOR A SEMICONDUCTOR MANUFACTURING PROCESS CAPABLE OF VAPORIZING A LIQUID SOURCE FOR FORMING A THIN FILM AND SUPPLYING THE VAPORIZED LIQUID SOURCE TO A REACTION CHAMBER

摘要

PURPOSE: A vaporizing apparatus for a semiconductor manufacturing process is provided to uniformly and effectively heat a liquid source, thereby increasing the vaporizing rate of the liquid source.;CONSTITUTION: A vaporization container(110) includes a vaporization chamber(111), an inlet(112), and an outlet(113). A spray nozzle(120) mixes a liquid source with a carrier gas and sprays the mixed gas to the vaporization chamber. A membrane-type heater(130) heats the liquid source and the carrier gas flowing into the vaporization chamber. The membrane-type heater comprises a metal membrane(131) and a plurality of holes. The metal membrane is made of electrical resistances. The holes of various sizes are placed in the metal membrane.;COPYRIGHT KIPO 2012