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Method for drying vaporizable liquid film formed on surface of substrate, involves arranging heating surface of heat source at predetermined spacing away from substrate surface, for removing vaporized liquid towards heat source
Method for drying vaporizable liquid film formed on surface of substrate, involves arranging heating surface of heat source at predetermined spacing away from substrate surface, for removing vaporized liquid towards heat source
The method involves transporting the substrate on a transportation surface of a transport apparatus along transport direction, by using a drying apparatus. The liquid film formed on the surface of substrate is vaporized by a heating surface of a heat source. The heating surface of the heat source is in a spacing of 0.1-5 mm away from the substrate surface, for removing the vaporized liquid towards the heat source. The temperature of heating surface is controlled based on the boundary surface temperature of liquid. An independent claim is included for a device for drying vaporizable liquid film formed on surface of substrate.
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