首页> 外国专利> CLEAN-IN-PLACE SYSTEM AND A CLEANING METHOD THEREOF USING A COMMON PIPE STRUCTURE IN MANUFACTURING AND CLEANING PROCESSES

CLEAN-IN-PLACE SYSTEM AND A CLEANING METHOD THEREOF USING A COMMON PIPE STRUCTURE IN MANUFACTURING AND CLEANING PROCESSES

机译:在制造和清洁过程中使用通用管道结构的在地清洁系统及其清洁方法

摘要

PURPOSE: A clean-in-place system and a cleaning method thereof are provided to reduce manufacturing and cleaning costs by performing the manufacturing and cleaning processes of an object using a pump.;CONSTITUTION: A clean-in-place system(110) comprises first and second treatment units, a cleaning liquid supply pipe, and a cleaning liquid recovery pipe(123). The first and second treatment units are connected to each other through a material transfer pipe(111). The cleaning liquid supply pipe is connected to the first treatment unit and supplies a cleaning liquid to the first treatment unit. The cleaning liquid recovery pipe recovers the cleaning liquid passing through the first treatment unit and the material transfer pipe.;COPYRIGHT KIPO 2012
机译:目的:提供一种就地清洁系统及其清洁方法,以通过使用泵执行物体的制造和清洁过程来降低制造和清洁成本。构成:一种就地清洁系统(110),包括第一和第二处理单元,清洗液供应管和清洗液回收管(123)。第一和第二处理单元通过材料输送管(111)彼此连接。清洁液供应管连接到第一处理单元,并且将清洁液供应到第一处理单元。清洗液回收管回收通过第一处理单元和物料输送管的清洗液。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20120037294A

    专利类型

  • 公开/公告日2012-04-19

    原文格式PDF

  • 申请/专利权人 KWON HYUK JIN;

    申请/专利号KR20100098960

  • 发明设计人 KWON HYUK JIN;

    申请日2010-10-11

  • 分类号B08B9/032;A61J3/00;B08B3/04;

  • 国家 KR

  • 入库时间 2022-08-21 17:10:14

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