首页> 外国专利> PHOTO-SENSITIVE RESIN COMPOSITION, A DRY FILM SOLDER RESIST, AND A CIRCUIT BOARD CAPABLE OF IMPROVING PHOTO-CURABLE CHARACTERISTIC AND COATING TOLERANCE BY INCLUDING ACID MODIFIED OLIGOMER, PHOTO-POLYMERIZABLE MONOMER, A THERMOSETTING BINDER RESIN, A PHOTO-INITIATOR, AND A THIOXANTHONE COMPOUND

PHOTO-SENSITIVE RESIN COMPOSITION, A DRY FILM SOLDER RESIST, AND A CIRCUIT BOARD CAPABLE OF IMPROVING PHOTO-CURABLE CHARACTERISTIC AND COATING TOLERANCE BY INCLUDING ACID MODIFIED OLIGOMER, PHOTO-POLYMERIZABLE MONOMER, A THERMOSETTING BINDER RESIN, A PHOTO-INITIATOR, AND A THIOXANTHONE COMPOUND

机译:光敏树脂组合物,干膜防焊胶和电路板,可通过添加酸改性的低聚物,光聚合性单体,热固性树脂和热固性树脂来提高光固化性和涂料耐受性复合

摘要

PURPOSE: A photo-sensitive resin composition, a dry film solder resist, and a circuit board are provided to improve the mechanical characteristic and the heat resistance characteristic of photo-sensitive materials.;CONSTITUTION: A photo-sensitive resin composition includes acid modified oligomer, photo-polymerizable monomer, a thermosetting binder resin, a photo-initiator, and a thioxanthone compound. The thioxanthone compound includes a compound represented by chemical formula 1. In chemical formula 1, R1 to R8 are capable of being identical or different and are respectively C1 to C5 alkyl groups, C1 to C5 alkylene groups, or C1 to C5 alkenyl groups. The acid modified oligomer includes carboxylic group and vinyl group substituted oligomer. The acid value of the acid modified oligomer is between 40 and 120 mgKOH/g. The photo-polymerizable monomer includes a polyfunctional compound with two or more vinyl groups.;COPYRIGHT KIPO 2012
机译:目的:提供一种光敏树脂组合物,干膜阻焊剂和电路板,以改善光敏材料的机械特性和耐热特性。;组成:一种光敏树脂组合物,包括酸改性的低聚物,可光聚合的单体,热固性粘合剂树脂,光引发剂和噻吨酮化合物。噻吨酮化合物包括由化学式1表示的化合物。在化学式1中,R 1至R 8可以相同或不同,并且分别为C 1至C 5烷基,C 1至C 5亚烷基或C 1至C 5烯基。酸改性的低聚物包括羧基和乙烯基取代的低聚物。酸改性的低聚物的酸值为40至120mgKOH / g。可光聚合单体包括具有两个或多个乙烯基的多官能化合物。; COPYRIGHT KIPO 2012

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