PHOTOSENSITIVE RESIN COMPOSITION FOR A DRY FILM PHOTORESIST CAPABLE OF IMPROVING RESISTANCE TO CHEMICAL BY INCLUDING A THIOXANTHONE DERIVATIVE CONTAINING PHOTO-POLYMERIZATION INITIATOR AND A PHOTO-POLYMERIZABLE OLIGOMER

摘要

PURPOSE: A photosensitive resin composition for a dry film photoresist is provided to implement an exposing operation based on the minute amount of energy and to improve resistance characteristic to a developing solution.;CONSTITUTION: A photosensitive resin composition includes a photo-polymerization initiator, an alkali developing binder polymer, a photo-polymerizable oligomer, and a solvent. The photo-polymerization initiator includes a compound represented by chemical formula 1. The photo-polymerizable oligomer includes a compound represented by chemical formula 2. In chemical formula 1, R1 to R4 are respectively hydrogen elements, halogen elements, C1 to C5 alkyl groups, and C1 to C5 alkyl oxide groups. In chemical formula 2, R1 and R2 are respectively hydrogen elements, halogen elements, C1 to C5 alkyl groups, and C1 to C5 alkyl oxide groups; m is the integer of 0 to 30; n is the integer of 0 to 30; and the sum of m and n is in a range between 1 and 60.;COPYRIGHT KIPO 2012