A METHOD FOR PREPARING PATTERN IN LARGE SCALE USING LASER INTERFERENCE LITHOGRAPHY, A METHOD FOR TRANSFERRING THE PATTERN ONTO NON-UNIFORM SURFACE AND AN ARTICLE TRANSFERRED PATTERN USING THE SAME

摘要

PURPOSE: A method for preparing large sized micro-patterns using laser exposure interferometry, a method for transferring the micro-patterns onto a non-uniform surface, and an article with the transferred micro-patterns using the same are provided to effectively transfer the micro-patterns regardless of the surface states of articles. CONSTITUTION: A method for preparing large sized micro-patterns includes the following: a sacrificial layer is coated on the planar upper side of a substrate; a pattern forming layer is coated on the upper side of the sacrificial layer; micro-patterns are formed on the upper side of the pattern forming layer; the sacrificial layer is etched to separate the pattern forming layer form the substrate; and the separated pattern forming layer is attached to a target article. The substrate is based on silicon or glass. Micro-patterns are formed based on laser exposure interferometry.