NON-HALOGENATED ETCHANT FOR ETCHING AN INDIUM OXIDE LAYER AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE NON-HALOGENATED ETCHANT

摘要

PURPOSE: A non-halogen etchant of an indium oxide layer is provided to minimize damages to a lower during process etching an indium oxide layer which is an upper layer even if a copper layer or an aluminum layer is formed in the lower layer of the indium oxide layer. CONSTITUTION: A non-halogen etchant of an indium oxide layer comprises nitric acid, sulfuric acid, corrosion inhibitor comprising ammonium(NH4^+), a cyclic amine compound, and water. A manufacturing method of a display substrate comprises: a step of forming a switching element(SW) comprising a gate electrode(GE), a source electrode(SE), and a drain electrode(DE) on a substrate(110); a step of forming an indium oxide layer(INL1) on a substrate on which the switching element is formed; a step of forming a first pixel electrode(PE1), which contacts to the drain electrode by patterning the indium oxide layer by using the non-halogen etchant.