首页> 外国专利> METHOD FOR FORMING A GERMANIUM OXIDE FILM CAPABLE OF IMPROVING A HIGH-K FILM AND AN INTERFACIAL PROPERTY OF A GERMANIUM BOARD AND A MATERIAL FOR AN ELECTRONIC DEVICE

METHOD FOR FORMING A GERMANIUM OXIDE FILM CAPABLE OF IMPROVING A HIGH-K FILM AND AN INTERFACIAL PROPERTY OF A GERMANIUM BOARD AND A MATERIAL FOR AN ELECTRONIC DEVICE

机译:形成可改善高k膜的锗氧化物膜的方法以及电子设备用锗板和材料的界面特性

摘要

PURPOSE: A method for forming a germanium oxide film and a material for an electronic device are provided to control unstable separation of the germanium oxide film by forming the germanium oxide film on a germanium board in which a High-k film is formed.;CONSTITUTION: A processing container(11) receives a board supporter(12). A board supporter maintains a germanium oxide film substrate(W). A slot plate(14) is located on a dielectric microwave transmissive plate(13). A plurality of long holes(14a) is formed on the slot plate. A gas source(24) is connected to a gas nozzle(22) passing through a gas pipe line(23).;COPYRIGHT KIPO 2013;[Reference numerals] (17) Microwave supply device; (24) Gas supply source
机译:目的:提供一种形成氧化锗膜的方法和一种用于电子设备的材料,以通过在形成有高k膜的锗板上形成氧化锗膜来控制氧化锗膜的不稳定分离。 :处理容器(11)接收板支撑件(12)。板支撑件保持氧化锗膜基板(W)。缝隙板(14)位于介电微波透射板(13)上。在槽板上形成有多个长孔(14a)。气体源(24)连接至穿过气体管道(23)的气体喷嘴(22)。COPYRIGHT KIPO 2013; [附图标记](17)微波供应装置; (24)气源

著录项

  • 公开/公告号KR20120112264A

    专利类型

  • 公开/公告日2012-10-11

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LIMITED;

    申请/专利号KR20120033539

  • 发明设计人 KABE YOSHIRO;OSAKI YOSHINORI;

    申请日2012-03-30

  • 分类号H01L21/316;H01L21/205;

  • 国家 KR

  • 入库时间 2022-08-21 17:09:00

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