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METHOD OF GRAPHENE QDS FORMATION FOR THE NEXT GENERATION DISPLAY BY USING BLOCK COPOLYMER SELF-ASSEMBLED STRUCTURE

机译:利用嵌段共聚物自组装结构形成下一代石墨烯QDS的方法

摘要

PURPOSE: A manufacturing method of graphene quantum dots is provided to manufacture graphene quantum dots of a constant size by applying a block copolymer self-assembling process, thereby capable of improving an existing broad PL spectrum performance. CONSTITUTION: A manufacturing method of graphene quantum dots comprises: a step(S1) of spreading a block copolymer on a material layer consisting of a mono-layered graphene; a step(S2) of forming a self-assembled structure of a several to dozens nano meters on the material layer by heat-treating the block copolymer and phase separation; and a step(S3) of etching the material layer by using the self-assembled structure as a mask. [Reference numerals] (S1) Spreading a block copolymer on a monolayered graphene; (S2) Forming a self-assembled structure by heat-treating the block copolymer; (S3) Etching the monolayer by using the self-assembled structure as a mask
机译:目的:提供一种石墨烯量子点的制造方法,以通过应用嵌段共聚物自组装工艺来制造恒定尺寸的石墨烯量子点,从而能够改善现有的宽PL光谱性能。组成:石墨烯量子点的制造方法包括:步骤(S1),将嵌段共聚物铺展在由单层石墨烯组成的材料层上;步骤(S2),通过对嵌段共聚物进行热处理和相分离,在材料层上形成几十纳米至几十纳米的自组装结构。步骤S3,采用自组装结构作为掩模,对材料层进行刻蚀。 [S1]在单层石墨烯上涂布嵌段共聚物。 (S2)对嵌段共聚物进行热处理,形成自组装结构。 (S3)通过使用自组装结构作为掩模蚀刻单层

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