METHOD FOR INSPECTING A DEFECT OF A SEMICONDUCTOR DEVICE, A PHOTO MASK, AND THE SEMICONDUCTOR DEVICE MANUFACTURED BY THE SAME CAPABLE OF DETECTING AN ELECTRIC DEFECT OF A CONTACT PLUG

摘要

PURPOSE: A method for inspecting a defect of a semiconductor device, a photo mask, and the semiconductor device manufactured by the same are provided to detect the defect of unit cell patterns by comparing reference data with cell data obtained by irradiating electron beams to a cell array region.;CONSTITUTION: Test patterns and unit cell patterns are formed on a substrate including a test region and a cell array region(S10). Reference data about test patterns is collected by irradiating electron beams to the test region(S20). Cell data is collected by irradiating the electron beams to the cell array region(S30). Defects of the unit cell patterns are detected by comparing the cell data with the reference data(S40).;COPYRIGHT KIPO 2013;[Reference numerals] (S10) Forming test patterns and unit cell patterns in a test region and a cell array region; (S20) Collecting reference data by radiating a test region with electron beams; (S30) Collecting cell data by radiating a cell array region with electron beams; (S40) Detecting defects of unit cell patterns by comparing cell data with reference data